Prof. Uroš Cvelbar discussed their work on plasma assisted graphene nanowall growth on plasma treated substrates in changing conditions of pressure and temperature as well as different gas mixtures. His group and collaborators worked on a computational model of large scale production. The model confirmed that lateral surface diffusion through nanoflakes are the main mechanism in catalysis rather than vertical particle transfer because of the ion bombardment causing surface defects and resulting an increase in surface adsorption energy. This was the key takeaway for my future research on understanding of the mechanisms of plasma sintering.
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